First order process modeling can help tremendously with process setup and integration challenges that occur in a semiconductor fabrication flow, by visualizing process variation problems “virtually” ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Diverging and converging patterns forming on the surface of solidifying liquid metals resemble plotlines in a complex historical novel, in a new international study. The cyclic patterns observed are ...

Too often, design engineers look at coating parts as an afterthought. Rather than being part of the discussion in the early stages of design, engineers sometimes try to solve problems with coatings ...