Elimination of Pinhole Defects in Self-Aligned Double Patterning Process by using Bias Pulsed Plasma
Abstract: Self-aligned double patterning (SADP) is extensively utilized in advanced sub-20nm technology nodes. The DRAM digit contact SADP dry etch process experienced severe yield loss due to pinhole ...
Abstract: Stemming from complex mechanisms and working conditions of bearings, single degradation models often fail to adequately describe complex degradation process and provide reliable prediction ...
The Justice Department shelved an investigation into former President Joe Biden's use of an autopen, a person briefed on the matter told NBC News on Wednesday. Justice Department pardon attorney Ed ...
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